As manufacturing techniques advance, new materials and cathode designs pose greater challenges to process stability and film repeatability. The AMS provides advanced arc management. This paper gives an overview about the main features characterizing the next generation of Mid-Frequency plasma power supplies and presents results of investigations which have been undertaken in plasma processes. For more than 20 years high power dual magnetron sputtering is used in a variety of. Using the Integrated Power Module (IPM), which is a high current solid-state switch, and high voltage nanosecond pulsers (NSPs), EHT developed a solid-state system to initiate, drive, and modulate an arc. To assure control of film thickness, ion implantation dose, and arc. Today, power supply designers must create power conversion products that offer greater efficiency, higher power density, higher reliability, advanced communications and sophisticated control features. Evaporator power supply for ARC-PVD coating.
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